Photomasks & Mask Blanks companies
10 companies in the Photomasks & Mask Blanks part of the semiconductor & AI value chain.
Companies
- HOYA — Dominant maker of EUV photomask blanks and substrates.
- Mitsui Chemicals, Inc. — First commercial EUV pellicle manufacturer (ASML license); developing CNT pellicles for High-NA EUV.
- Photronics — Largest merchant photomask manufacturer.
- Dai Nippon Printing — Top-tier photomask producer alongside its printing businesses.
- TOPPAN Holdings — Major merchant photomask maker within diversified printing group.
- AGC Inc. — Glass and chemicals maker; leading EUV photomask blanks and fluorinated gases.
- Ohara Inc. — Japanese optical and electronic glass maker; supplies low-expansion glass-ceramics and quartz glass for semiconductor exposure equipment and photomask substrates.
- SCHOTT AG — German specialty glass maker owned by the Carl Zeiss Foundation; supplies fused quartz for etch/epitaxy/diffusion equipment, photomask blank glass, and photostructurable FOTURAN glass wafers.
- Taiwan Mask Corporation — Taiwanese merchant photomask maker.
- SK Enpulse — SK affiliate; divested CMP pads to Hahn & Co. and blank photomasks to Fusion New Material in 2025; absorbed into parent SKC via merger effective 2025-12-23, ceasing as an operating company.
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